According to Fast Technologies, ASML will increase the annual shipment of EUV lithography machines from 18 to 30 this year. According to the latest news from the industry chain, TSMC will include 18 of ASML's EUV lithogr...

This year, TSI, Samsung and Globalfoundries will produce 7Nm technology, the first generation 7Nm process will use the traditional DUV lithography process, the two generation 7Nm will be EUV photolithography process, is expected to be produced next year. When will the storage chip industry use EUV technology? In the light of Mei Guang, EUV lithography is not required by DRAM chip. It can't be used in the next few years. In the new generation process, they are checking 1Y nm memory chips by customers. In the future, there are 1Z, 1 alpha and 1 beta technology in the future.

Intel 10nm technology is still struggling, TSI and Samsung have begun to produce 7Nm, the next step is 5nm, and TSI has also recently opened some of the key indicators of 5nm, which seems not to be very optimistic.

KLA-Tencor announces the launch of the new FlashScan ™ blank mask * detection product line. Since the launch of the first inspection system in 1978, KLA-Tencor has been a major supplier of pattern mask inspection, and the new FlashScan product line has announced that the company has entered a dedicated blank mask inspection market.